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Home > Products >  Oxygen O2

Oxygen O2 CAS NO.7782-44-7

  • Min.Order: 1 Metric Ton
  • Payment Terms: L/C,T/T,
  • Product Details

Keywords

  • Oxygen O2
  • Industrial Gases
  • China industrial gases

Quick Details

  • ProName: Oxygen O2
  • CasNo: 7782-44-7
  • Application: Industry Use, Medical Use, Semiconduct...
  • DeliveryTime: 20-30 days
  • PackAge: depends
  • Port: Qingdao, Shanghai, Ningbo, Shenzhen, X...
  • ProductionCapacity: Metric Ton/Day
  • Purity: 99.995%-99.9997%
  • LimitNum: 1 Metric Ton
  • Grade: Industrial Grade,Pharma Grade,Electron...

Superiority

 
 
CAS No.: 7782-44-7
EINECS No.: 231-956-9
UN No.: UN1072
Purity: 99.995%-99.9997%
Dot Class: 2.2
Appearance: Colorless
Grade Standard: Industrial Grade, Medical Grade, Electronic Grade.
 
Industry Use:
Steel making, non-ferrous metal smelting.Cutting metal material.
 
Medical Use:
In first-aid treatment of emergencies such as suffocation and heart attack, in the treatment of patients with respiratory disorders and in anaesthesia.
 
Semiconductor Fabrication:
Chemical vapour deposition of silicon dioxide, thermal oxide growth, plasma etching, plasma stripping of photoresist and carrier gas in certain deposition/diffusion operations.
 

 

TYHJ focuses on Industrial Gases development, including Oxygen, Fire Extinguishers Carbon Dioxide, CO2, SO2, H2, N2.

Details

 
 
CAS No.: 7782-44-7
EINECS No.: 231-956-9
UN No.: UN1072
Purity: 99.995%-99.9997%
Dot Class: 2.2
Appearance: Colorless
Grade Standard: Industrial Grade, Medical Grade, Electronic Grade.
 
Industry Use:
Steel making, non-ferrous metal smelting.Cutting metal material.
 
Medical Use:
In first-aid treatment of emergencies such as suffocation and heart attack, in the treatment of patients with respiratory disorders and 
 
in anaesthesia.
 
Semiconductor Fabrication:
Chemical vapour deposition of silicon dioxide, thermal oxide growth, plasma etching, plasma stripping of photoresist and carrier gas in 
 
certain deposition/diffusion operations.
 

 

TYHJ focuses on Industrial Gases development, including Oxygen, Fire Extinguishers Carbon Dioxide, CO2, SO2, H2, N2.

 

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